JIANG Shu-fa, ZHANG Guo-jun. Design of a Bandgap Reference in Bipolar Process Based on Piecewise Temperature Curvature-Correct Technology[J]. Microelectronics & Computer, 2013, 30(4): 75-78.
Citation: JIANG Shu-fa, ZHANG Guo-jun. Design of a Bandgap Reference in Bipolar Process Based on Piecewise Temperature Curvature-Correct Technology[J]. Microelectronics & Computer, 2013, 30(4): 75-78.

Design of a Bandgap Reference in Bipolar Process Based on Piecewise Temperature Curvature-Correct Technology

  • This paper presents a bandgap reference in bipolar process which is used in Low - dropout linear regulator.The reference has an enable circuit to reduce the power consumption in shutdown mode.When the circuit is shutdown,the current to ground is 34.419pA.Considering the Low-dropout linear regulator's application environment,a piecewise curvature - corrected technology is used for reducing the voltage drift when the chip temperature is high.The PPM of this circuit is 25.7/ C when the temperature is switch form -40℃to 140℃.The reference is designed without any operational amplifier to reduce the impact of the Op-Amp's offset voltage and the PSRR of this bandgap reference is -80.33dB.The reference skews 0.3mV under the supply voltage ranging from 2.5V to 6V.
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