石广源, 王新, 孙永斌. 功率VUMOSFET器件阈值电压最佳化设计[J]. 微电子学与计算机, 2010, 27(6): 131-133.
引用本文: 石广源, 王新, 孙永斌. 功率VUMOSFET器件阈值电压最佳化设计[J]. 微电子学与计算机, 2010, 27(6): 131-133.
SHI Guang-yuan, WANG Xin, SUN Yong-bin. The Threshold Voltage Best Design of Power VUMOSFET Devices[J]. Microelectronics & Computer, 2010, 27(6): 131-133.
Citation: SHI Guang-yuan, WANG Xin, SUN Yong-bin. The Threshold Voltage Best Design of Power VUMOSFET Devices[J]. Microelectronics & Computer, 2010, 27(6): 131-133.

功率VUMOSFET器件阈值电压最佳化设计

The Threshold Voltage Best Design of Power VUMOSFET Devices

  • 摘要: 从功率VUMOSFET器件结构出发,通过使用模拟软件SILVACO进行工艺和器件仿真,根据仿真结果分析了器件沟道掺杂浓度分布对阈值电压的影响,进而提出工艺改进的措施.对功率VUMOSFET的设计与生产具有指导意义.

     

    Abstract: This article start from the structure of power VUMOSFET, through the use of simulation software SILVACO for process and device simulation, simulation results based on analysis of the device channel doping concentration distribution on the impact of threshold voltage, and process improvement measures put forward.In this paper, power VUMOSFET Design and production guidance.

     

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